Our Products
Electronic Chemicals

Photoresists and Ancillaries |
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Cyclic polyisoprene resins with a bisarylazide photoactive compound and a copolymer of glycidyl methacrylate and ethyl acrylate. |
Tetramethylammonium hydroxide (TMAoH) |
N-methyl pyrrolidone (NMP) |
Hexamethyldisilazane (HMDS) |
Propylene glycol monomethyl ether acetate (PGMEA) |
Chemical mechanical planarization (CMP) slurries |
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Fumed/Colloidal Silica |
Potassium Hydroxide |
Ammonium Hydroxide |
Hydrogen Peroxide |
Ferrous Nitrate |
Hydroxylamine |
Cleaning Chemicals |
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Mixture of Ammonium Hydroxide and Hydrogen peroxide (30%) |
Mixture of hot Sulfuric acid and Hydrogen Peroxide (piranha acid). |
Hydrofluoric acid(49% concentration) |
Mixture of Hydrogen Peroxide and Hydrochloric Acid |
Isopropyl Alcohol |
1,1,1-trichloroethane |
Etching Chemicals |
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Acetic acid (99% concentration) |
Nitric acid (70% concentration) |
Phosphoric acid(80% concentration) |
Ammonium fluoride |
Thin film metals (metal sputtering) |
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Al-Si-Cu alloys containing 1% silicon, 0.5% copper, and the balance aluminum |
Copper Plating Chemicals |
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Copper Sulfate |
Sulfuric Acid |
Polyethylene glycol (PEG) |
Polypropylene glycol(PPG) |
Propylene glycol monomethyl ether acetate (PGMEA) |
Dielectric materials |
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Silicon dioxide |
Methylsilane, trimethylsilane, and tetramethylsilane |
Trimethylcyclotetrasiloxane (TMCTS) |
Octamethylcyclotetrasiloxane (OMCTS) |
Dimethyldimethoxysilane (DMDMOS) |
Diethoxydimethylsilane (DEMS) |
Hafnium Tetrachloride |
Zirconium Tetrachloride |